An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nmGOLDBERG, Kenneth A; MOCHI, Iacopo; REKAWA, Senajith B et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 796910.1-796910.12, 2Conference Paper

The SEMATECH Berkeley MET: extending EUV learning to 16-nm half pitchANDERSON, Christopher N; MAE BACLEA-AN, Lorie; DENHAM, Paul E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79690R.1-79690R.6, 2Conference Paper